Welcome

Since 2001 we supply a growing number of research institutes, start-ups and production facilities in the field of micro-structuring with photo resists, ancillaries, solvents, and etchants in semiconductor quality.

Beside our continuously growing product range, it's our utmost concern to assist you with related technical support, short lead times, and suited sales units.

Do you have any technical questions concerning your litho processes, or our products? Please do not hesitate to contact us!

Your Team MicroChemicals

! IMPORTANT NOTE REGARDING AZ 9260 !

This week (KW34) we were informed by the manufacturer Merck, whose distributor we are, that due to an ingredient (based on PFOS surfactants) the resists AZ 9260 and AZ 9245 are now no longer available and may no longer be placed on the market, according to which there are no salable stocks remaining.

You can find the official letter from the manufacturer together with an updated MSDS below. However, with the AZ 10 XT there exists a PFOS-free alternative, otherwise - to a large extent - identical to the AZ 9260, which should allow you to continue your previous processes with the same parameters and the same results.

We will gladly send you samples on request.
Please contact us: sales(at)microchemicals.de

Thank you for understanding!

> Letter
> AZ 10XT vs. AZ 9260

> TDS AZ 10XT

> MSDS AZ 9260
> MSDS AZ 9245
> MSDS AZ 10XT (520 CP)
> MSDS AZ 10XT (220 CP)

Our New Products

Source:"Metal-Lift-off" © intelligent fluids®, intelligent-fluids.com

Our new Strippers

Photoresist Stripper SVD and SH5

The strippers easily removes layers of photoresists (PR) from inorganic substrates such as silicon, glass and metals (e.g. copper). The smart intelligent fluids® (IF) mode of action is not based on aggressive dissolving processes as in the case of many conventional products. Instead, intelligent fluids® enable a gentle physical detaching even of persistent layers, without damaging the substrate surface.

The strippers works with highly dynamic phase structures in two steps:

● infiltration and fragmentation of the layer
● wrapping and removal of fragments

Negative-tone photoresists will be detached in larger fragments and can be filtered off. Positive-tone photoresists on the other hand will be incorporated
into the fluid.

Advantages:

● water-based
● pH neutral to the skin (pH: 5.5 – 6.5)
● non-toxic, non-flammable
● safe-to-handle
● dermatologically tested - “excellent”
● readily biodegradable

More Information:

> Photoresist Stripper SVD
> Photoresist Stipper SH5

Technical Data Sheet:

For further information please refer to the technical data sheet:
> Photoresist Stripper SVD (TDS)
> Photoresist Stripper SH5 (TDS)

NOW AVAILABLE

Acetone and Isopropyl Alcohol from MicroChemicals

We are now offering our new MicroChemicals Acetone and Isopropyl Alcohol in ULSI quality. Our solvents are available in 2.5 L containers and can be ordered as single bottles or in the packaging unit of 4 x 2.5 L. Both products are ideal for substrate cleaning for organic contaminants and particles.

> Acetone
> Isopropyl Alcohol

> Info sheet
> Specification Acetone
> Specification Isopropyl Alcohol

If you are interested in further technical information or a free sample, please don't hestitate to contact us. > sales(at)microchemicals.com

New: Technical Guideline

Application Areas and Compatibilities of our Photoresists, Developers and Removers

With the information collected in this document, we would like to give you an initial overview of the basic areas of application and compatibility of our
photo chemicals.
Easily find the right developer, stripper and remover for your photoresist with our guideline.

We would be happy to advise you in more detail personally!

> Technical Guideline

Application Areas and Compatibilities
> Download PDF

Our Book Photolithography 2017

The last few months we have been working on a new edition of our brochures. For the first time, we have compiled all themes about photolithography in one softcover book. All contents and information of the previous edition have been revised, updated and renewed.

If you are interested in our book Photolithography - Basics of Microstructuring, please fill in the order form:

> book order

 

Semicon 2018 in Munich

We say thanks to all customers, partners and prospects who have visited us at Semicon and Productronica 2018 in Munich at our booth. It was a very successful show with important and interesting encounters for us.

Photolithographie - Basics of Microstructuring
(not available as PDF)