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Remover / Stripper

AZ 100 Remover
AZ^® 100 Remover is based on solvent and amine. AZ^® 100 Remover is used for photoresist stripping with low attack to aluminium. Low hazard is achieved by avoiding use of ethanol amine.

Low evaporation rate allows for use at elevated temperatures (up to 80°C), high efficiency (>3000 wafer per litre) helps saving costs. Where attack to aluminium is of no concern, it may even be diluted with water.
AZ 100 Remover is not compatible with AZ nLof 2070 (AZ nLof 2000 series) resists.

For further information refer AZ 100 Remover.pdf

TechniStrip^® P1316 - High Performance Removers
TechniStrip^® P1316 is a powerful NMP-free remover for

• Novolak-based positive resists such as all positive AZ^® resists.
• Epoxy-based resists
• Polyimides, bonding glues
• Dry films

At 75°C, TechniStrip^® P1316 is able to dissolve – not only peel – even heavily crosslinked resists (e. g. by dry etching or ion implantation) from the substrate in few minutes.
TechniStrip^® P1316 can be used in batch immersion and batch spray equipment, as well as in single wafers cleaning tools due to its high stripping efficiency.

For further information refer TF TechniStrip P1316

TechniStrip® NI555
TechniStrip^® NI555 is a powerful remover for Novolak-based negative resists and ultrathick positive resists such as

• AZ® nLOF 2000
• AZ® 15 nXT
• AZ® 40 XT

TechniStrip^® NI555 was developed to address fast and complete photoresist film dissolution thus avoiding filter clogging and subsequent insoluble resin debris deposition encountered with most of standard stripping solutions.

A crosslinked AZ® 15 nXT film peels from the substrate in DMSO-, NMP- or TMAH-based strippers (left), while TechniStrip^® NI555 completely dissolves the resist film after 20 minutes. Image taken from the technical documentation of TECHNIC INC.

For further information refer TF TechniStrip NI555

DMSO (Dimethylsulfoxide)
DMSO is a very well suited substitute for the NMP that is regarded as toxic since a while. As a stripper or as lift off media, DMSO can be regarded as non toxic alternative to NMP. Mixtures with Cyclopentanone or with MEK even increase the strip performance of this product.

For further information refer DMSO Dimethylsulfoxide.pdf

NMP (1-methyl-2-pyrrolidone)
NMP is a powerful lift-off medium due to its physical properties: NMP yields a low vapour pressure (no striation formation), strongly solves organic impurities as well as resists, keeps solved particles in solution, and can be heated due to its high boiling point. 
For the same reasons, NMP (pure or diluted in H₂O) gives a very well-suited stripper for photoresists processed under harsh conditions.

For further information refer NMP.pdf

^®AZ, the AZ logo, BARLi , Aquatar and Kallista are registered trademarks of AZ Electronic Materials.