PL 177 Photoresist
AZ® PL 177
Film thickness: 1 ... 10 μm (depending on the deposition methot)
UV-sensitivity: i-, h-, g-line (310 - 440 nm), broadband/monochromatic
Sales volumes: 250 ml, 500 ml, 1.000 ml, 2500 ml and 5 Liter
General Information
AZ® PL 177 is a positive tone liquid
photoresist for the application in various coating
techniques, especially for printed circuit boards
manufacturing. AZ® PL 177 can be used in all
those places, where layouts are directly to be copied
onto and subsequently transferred into a substrate by
The essential features of AZ® PL 177 include:
- high resolution potential
- good drying behaviour
- aqueous-alkaline processability
- halogen free coating solvent
- possibility of multiple exposure (selective
plating process) light or bright day light should be
avoided
- storability of coated substrates
- blue coloured for easy inspection
PL 177 can be applied by dip coating. By dilution
with suitable solvents PL 177 can be adjusted to also
meet the viscosity and drying requirements of other
coating techniques (spray coating, roller coating, spin
coating). PL 177 is resistant towards acidic and
ammoniacal etchants as well as acidic and neutral
plating baths.
The final removal of the temporary resist layer, the
stripping, is done with low concentrated bases. PL 177
is used in the manufacturing of printed circuit boards,
multilayer inner flexible boards and in chemical milling.
Development
AZ® Developer also possible are AZ® 400K 1:4 or AZ® 826MIF as well as simple NaOH and KOH solutions.
For further information refer Photoresist
AZ PL 177.pdf
®AZ, the AZ logo, BARLi , Aquatar and
Kallista are registered trademarks of AZ Electronic
Materials.
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