AZ MiR 701 Photoresist
AZ MIR 701
High Resolution and Temperature Stability
Film thickness: 900 nm at 4.000 rpm, few 100 nm by dilution
UV-sensitivity: i-, h-, g-line (310 - 440 nm), broadband or monochromatic
Sales volumes: 250 ml, 500 ml, 1000 ml, 2.5 L, and 3.78 L
General Information
AZ® 701 MiR is a thermally stable (softening point >130°C), high resolution photo resist optimized for dry etching of sub-μm struc- tures.
For even higher resolutions applying e. g. laser interfer- ence lithography, AZ® 701 MiR can be further diluted to 500 nm and below.
Development
Left: 300 nm resist lines attained with the AZ® 701 MiR. Right: A 1.2 μm structure after 130°C hardbake. Source: AZ® MiR 701 Product Data Sheet by AZ-EM®
AZ® 726 MIF or AZ® 351B 1 : 4 recommended; AZ® 400K 1 : 4 or AZ® 326 MIF
possible
For further information refer Photoresist
AZ MIR_701.pdf
®AZ, the AZ logo, BARLi , Aquatar and
Kallista are registered trademarks of AZ Electronic
Materials.
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