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Deep-UV Photoresist
AZ TX 1311

AZ TX 1311

Film thickness: 2-4 μm
UV-sesitivity: 248 nm
Sales volumes: 250ml, 500 ml, 1000 ml, 3.78 L (gallon)

General Information
The AZ TX 1311 is a deep-UV (DUV) photoresist. This 248 nm photo resist with a thicknes up to 4 μm is designed e.g. for high energy implant applications.

Lithography Performance, 0.40 μm spaces at film-thickness of 3.8 μm

Lithography Performance, 0.40μm lines at film-thickness of 3.8 μm

  
For further information refer Deep-UV Photoresist AZ TX 1311.pdf

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