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MIC Developers (metal-ion containing)

AZ^® Developer (MIC) 
AZ^® Developer (MIC) is optimized for minimum Al attack. It is typically applied 1:1 diluted in DI-H₂O for high contrast, or undiluted for a high development rate. The dark erosion of AZ^® Developer is slightly higher as compared to other developers.
AZ^® Developer can be used in combination with most families of AZ Photoresists (i.e. AZ 1500, AZ 6600
and AZ 4500). 
It is designed to meet the demanding microlithographic and processing requirements of the semiconductor industry and tuned to lowest attack of aluminium. It is an odourless, aqueous, inorganic, alkaline solution, which is compatible with batch and in-line developing processes. Precise manufacture and stringent quality control ensure batch-to-batch reproducibility and product quality.
  
AZ Developer is supplied as a concentrate. The standard high-contrast make-up provides superior resolution and contrast as well as broad processing latitude. Use of the concentrated AZ Developer as a high-speed make-up results in very high production throughput. AZ^® Developer displays the lowest aluminium etch rate of all AZ Deveoper-types and is ideal for metal levels.
  
For further information refer AZ Developer.pdf

AZ^® 351B Developer (MIC)
AZ^® 351B (MIC) is based on buffered NaOH and typically used in 1:4 dilution.
  
For further information refer AZ 351B Developer (MIC).pdf

AZ^® 400K Developer (MIC)
AZ^® 400K (MIC) is based on buffered KOH and typically used in 1:4 dilution.
 
For further information refer AZ 400K Developer (MIC).pdf

AZ^® 303 Developer (MIC)
AZ^® 303 (MIC) is based on KOH and NaOH and designed for the resist AZ^® 111 XFS.
 
For further information refer AZ 303 Developer (MIC).pdf

  
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